JBX-3050MV Electron Beam Lithography System
The JBX-3050MV series is an electron beam lithography system for mask/reticle fabrication that meets the design rule of 45 to 32 nm. This system features pattern writing with high speed, high accuracy and high reliability, achieved by high-end technology.
Please Note
Not all JEOL products are available in every country. For specific information and more details about JEOL products available in your area, contact your local JEOL office or sales representative. Thank you.