JEM-9320 Focused Ion Beam System

JEM-9320FIBThe JEM-9320FIB Focused Ion Beam System uses an ion beam generated from a gallium (Ga) liquid metal ion source to fabricate specimens. The field-emission electron gun (FEG) provides a high beam current (30nA) with an extremely small probe. The ion beam is focused using an electrostatic-lens system, and scanned over the specimen which then emits secondary electrons from the sample. The result is scanning ion microscope (SIM) images.

By adjusting the beam current, The JEM-9320FIB can perform high-speed, pinpoint fabrication of a specific area of the specimen by means of a concentrated scan with a rectangular, line or spot beam. The JEM-9320FIB can prepare thin-film STEM/TEM specimens from a wide variety of materials which would otherwise be difficult if not impossible to examine. In addition, it can also fabricate cross section specimens for SEM examination.

Features

  • High-speed fabrication
  • High ion beam current of 30nA @ 30kV
  • Low accelerating voltage: 5kV
  • Simple preparation of thin-film for STEM and TEM
  • Side entry goniometer stage

Please Note

Not all JEOL products are available in every country. For specific information and more details about JEOL products available in your area, contact your local JEOL office or sales representative. Thank you.


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