EMU-220/330 CD-SEM for Mask Measurement

EMU-220/330Miniaturization of feature sizes for Optical Proximity Correction (OPC) masks and phase shift masks is accelerating, according to the International Roadmap for Semiconductor Technology. To achieve high-quality testing required to produce these high-performance masks, JEOL now offers the Holon Mask CD-SEM models EMU-220 and EMU-330.

Features

  • Highly stable observation and measurement of patterns on NGL photo masks
  • High-precision measurement by electrostatic EB scan
  • Charge neutralizer for low charge control
  • Anti-contamination device for low contamination
  • Image measurement system

Please Note

Not all JEOL products are available in every country. For specific information and more details about JEOL products available in your area, contact your local JEOL office or sales representative. Thank you.


NEWS