JEOL Electron Beam Lithography

We offer the widest range of e-beam tools for mask, reticle, and direct-write lithography, from high volume production to advanced research and development of NIL, photonic crystals, and sub-10 nanometer linewidths. Whether your applications are for next generation and beyond, production of ultra-high accuracy reticles and FET devices, ASIC fabrication, or direct pattern lithography on wafers, JEOL has a solution. We also offer an FEG SEM that is expandable for simple lithography and research applications.

Available Models

	Emitter	Accelerating Voltage	Min. Beam Size	Wafer Size	Beam Shape	Deflection
JBX-3050MV	LaB6 single crystal	50 kV		Substrate Size: 6 inch mask	Variable shaped	Vector scan
JBX-5500FS	ZrO/W TFE	50 kV / 25 kV	2nm	100mm wafer	Spot	Vector scan
JBX-6300FS	ZrO/W (Schottky)	100 kV / 50 kV / 25 kV	2nm	Up to 200mm wafer	Spot	Vector scan
JBX-9300FS	ZrO/W (Schottky)	100 kV / 50 kV	4nm (100 kV) 7nm (50 kV)	Up to 300mm wafer	Spot	Vector scan

Please Note

Not all JEOL products are available in every country. For specific information and more details about JEOL products available in your area, contact your local JEOL office or sales representative. Thank you.